Nitrogen Trifluoride (NF₃)

NF₃is a special gas used for cleaning chemical vapor deposition (CVD) chambers, used in the production of semiconductors, LCD and solar cells. CVD is a process that covers wafers or LCD plates with insulating or electrode film in the production of LCDs and solar cells to provide power for electronic features. After the film/membrane is produced through the CVD process, any such impurities like Sio2 and Si3N4 react with NF₃to create SiF4 gas, thus purifying the wafers and plates

Features

Purity
Production and supply from the standard 4N to high purity 5N (99.999%)
Reliability
Reliability is guaranteed with experience in supplying to various users

Specification

  Standard Spac. High Spec. Analyzer
Purity(%) > 99.99 > 99.999  
Impurity
(Vol .ppm)
H2O < 5 < 1 Moisture Analyzer
FT - IR
DID - GC
N2 < 10 < 1
O2 + Ar < 6 < 1
CF4 < 40 < 10
SF6 < 2 < 1
CO < 2 < 1
CO2 < 5 < 1
N2O < 3 < 1
HF < 2 < 1

Package

Container Valve (Connector) Type Filling Weight Material
47L Cylinder DISS 640,
CGV 330,
JIS 22R/L
20 / 22.7 kg Cr - Mo
Steel
Bundle 320lg
Ton - Cyliner DISS 640 200kg
ISO Container 20ft 4,000kg
40ft 8,000kg

Chief representatives

  • Sales Team
  • Namki Hur
  • TEL: 82-2-2146-5491
  • FAX: 82-2-2146-5499 
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* These are the numbers for those responsible for each of the business areas.

 
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Contact Target : Power&Industrial System / Power System PU

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