NF₃is a special gas used for cleaning chemical vapor deposition (CVD) chambers, used in the production of semiconductors, LCD and solar cells.
CVD is a process that covers wafers or LCD plates with insulating or electrode film in the production of LCDs and solar cells to provide power for electronic features. After the film/membrane is produced through the CVD process, any such impurities like Sio2 and Si3N4 react with NF₃to create SiF4 gas, thus purifying the wafers and plates
Production and supply from the standard 4N to high purity 5N (99.999%)
Reliability is guaranteed with experience in supplying to various users
Impurity (Vol .ppm)
Moisture Analyzer FT - IR DID - GC
O2 + Ar
Valve (Connector) Type
20 / 22.7 kg
Cr - Mo Steel
Ton - Cyliner
* These are the numbers for those responsible for each of the business areas.